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Cobalt silicide also called cobalt disilicide. Its chemical formula is CoSi2. Cobalt Silicide CoSi2 Pulp has low thermal resistance and good thermal stability.
Purity: 99%
Particle Size: 5-10um
Cobalt Silicide CoSi2 Pulver:
Cobalt Silicideis an intermetallic chemical, which is a silicate cobalt. Superconductor, it has a Ca-transition temperature.
Cobalt Disilicide. Chemical formula
CoSi2. Molecular weight 115.11.Dark brown homobic crystal. Melting Point 1277.Relative Density 5.3. You can oxidize it at 1200 to remove its surface. It reacts with fluorine and chlorine at low temperatures. Also, attack by hydrogen fluoride and dilute concentrated nitric acids and sulfuric acid. Molten strong alkali can also violently destroy it. You can slow it down by boiling concentrated hydrochloric.
CoSi2 powder exhibits low resistance and good thermal stability. This makes it a popular contact material in large-scale, integrated circuits.
CoSi2 shares a similar crystal structure as Si. Therefore, it is possible to form an epitaxial CoSi2/Si on Si substrate. This can be used for studying the interface characteristics in epitaxial silica metal.
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Cobalt Silicide CoSi2 powder Characteristics:
Cobalt silicide CoSi2 Powder (CAS12017-12-8) has a high melting temperature, high corrosion resistivity, and good electrical conductivity.
Technical Parameters of Cobalt Silicide CoSi2 powder:
Product name |
|
Purity |
Particle Size |
Melting Point |
Density |
|
silicide | with cobalt
CoSi2 |
99% |
5-10um |
1277 |
5.3 g/cm3 |
black |
How Cobalt Silicide CoSi2 Pu is produced?
Cobalt diicide manufacturing is generally done by first creating a metal cobalt layer (CO) on a silicon substrate. Then, after two annealing processes to convert cobalt from Cobalt silicicide to Cobalt, First, a diffusion process of small amounts of cobalt onto a siliceous substrate is used to create a layer cobalt Silicate (COSi). Second, to make the Cobalt disilicide (with a lower resistance) from the cobalt-silicate layer is an annealing procedure.
Cobalt Silicide CoSi2 powder
Cobalt Silicide CoSi2 Pulp is used in optoelectronic, electronic, and energy devices.
The potential for silica nanostructures has many important applications. Silicon silicides nanostructures (FeSi2) are used to create nano-electronic active device. Metal silicides (CoSi2, NickelSi2) could be used as nanowires in the future quantum computer and fault-tolerant, terahertz-nanocircuit computers. The ability to prepare epitaxial silicon silicide conductors on silicon substrates will greatly improve their performance compared with other metal nanowires. At the internal electrical connections points, such as drain, source and gate, Cobalt disilicide (CoSi2) are created.
Packing & Shipping of Cobalt Silicide CoSi2 powder:
There are many options for packing, which all depend on the amount of cobalt Si2 powder.
Cobalt silicide CoSi2 dust packing:
vacuum packaging, 1kg/bag and 25kg/barrel or as required
Cobalt silicide CoSi2 sulicide CoSi2 powder shipping could be sent out by sea, air or express once payment receipt has been received.
Lempotee Nano Technology Co. Ltd.
You can contact us to request high-quality COSi2
powder. (brad@ihpa.net)
Cobalt Silicide Properties
|
cobalt(II) silicide, cobalt disilicide,
cobalt monosilicide, CoSi (CoSi), and CoSi2 Powder
12017-12-8 |
|
CoSi2 |
Molecular Weigh |
115.104 |
Appearance |
Grey Black Powder |
Melting Point |
1277 |
Heating Point |
N/A |
Density |
5.3 g/cm3 |
Solubility of H2O |
Insoluble |
Exact |
114.87054 Da |
Cobalt Silicide Health & Safety Information
|
Danger |
Hazard Statements |
H315-H319-H334-H317-H351-H335 |
Hazard Codes |
Xi. Xn |
Risk Codes |
N/A |
Security Statements |
N/A |
Transport Information |
NONH all modes of transportation |
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