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Introduction of Titanium Silicide TiSi2 Pulver
Titanium disilicide
TiSi2 (the chemical formula) is an inorganic compound made of silicon and titan. It is a dark-gray square crystal which can also be powdered and used to make target materials. It’s a silica metal. These raw materials include titanium and the silicon metals. It exhibits high conductivity, high temperature stability and excellent electrical properties.
Titanium silicicide TiSi2 and powder’s physicochemical properties
Among metal silicides like TiSi2, NiSi. CoSi2, WSi2, TaSi2, MoSi2, etc., the titanium silicide is one of the most desirable. This silica has excellent electrical conductivity, selectivity, thermal stability and good adaptability.
Other Elements
Si: What does it mean?
Si (atomic symbol Si; atomic number fourteen) is an element in the Period P group 14, with an atomic Mass of 28.855. Silicium, which is second after oxygen in terms of its weight, makes up 25.7 per cent of the Earth’s crust. The metals are rarely found in their pure form. Instead, they are made from an iron/silicon alloy known as ferrosilicon. Glass’ main constituent is Element Silicon, also known as silicon dioxide. This is a cheap material with great mechanical, optical and thermal properties. You can make ultra-pure silica by adding boron or gallium, phosphorus or arsenic. Silicon is then used to manufacture transistors and solar cells.
What’s Ti?
With an atomic mass 47.867, Titanium, also known as Ti (atomic number 22), is a 4th-period group D element. The basic form of titanium is silver-gray with a white metallic look. Titanium can be chemically and physically identical to zirconium. This is because it has the same amount of valence electronics as titanium and falls under the same group on the periodic table. You can find five isotopes naturally: 46Ti-50Ti and 48Ti. The most common (73.8%) being titanium. It is also found in sedimentary rocks.
Titanium Silicide TiSi2 Pulver Production Methods
By reacting titanium with silicon, you can create titanium disilicide.
Ti + Ti 2Si = TiSi2
This can be done by sulfur, aluminum, and silicone dioxide.
A second method involves reacting titanium tetrachloride and silane, diclosilane, silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4
Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is commonly used. This silica is typically grown on silicon wires and polysilicon wires with self-aligning silicide technology. It reduces the resistance to local transistor connections by reducing their thin layers. This is a common use in the microelectronics field, where it’s used in the stage C54.
The source, gate, leak contacts and interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that the titanium silicide phases have low resistance (20m o –cm) as well as not to agglomerate in high-temperature treatments. For electronic applications, the Ti/Si system contains two silicide layers: C49 TiSi2 has a high resistivity (60-70mo-cm) and C54 TiSi2 has a low resistivity (15-20mo-cm), both formed at 700-850 degrees C.
Titanium siicide TiSi2 Pulver is main supplier
Lempotee advanced materials Nano Technology Co. Ltd. (Lempotee), is a trusted supplier and manufacturer of chemicals and Nanomaterials. They have over 12-years experience in manufacturing high-quality chemical products.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send an enquiry. (brad@ihpa.net)
Titanium silicicide TiSi2 and powder’s physicochemical properties
Among metal silicides like TiSi2, NiSi. CoSi2, WSi2, TaSi2, MoSi2, etc., the titanium silicide is one of the most desirable. This silica has excellent electrical conductivity, selectivity, thermal stability and good adaptability.
| Properties of Titanium Silicide TiSi2 Pulp | |
| Additional Names | TiSi2 Powder, titanium disilicide |
| No. | 12039-83-7 |
| Formula compound | TiSi2 |
| Molecular Weight | 104.04 |
| Appearance | black powder |
| Melting Point | 1470 degC |
| Boiling Point | N/A |
| Density | 4.02g/cm3 |
| Solubility in water | N/A |
| Get the exact Mass | 103.9018 |
Titanium Silicide TISi2 Powder, CAS 12039-83-7
Other Elements
Si: What does it mean?
Si (atomic symbol Si; atomic number fourteen) is an element in the Period P group 14, with an atomic Mass of 28.855. Silicium, which is second after oxygen in terms of its weight, makes up 25.7 per cent of the Earth’s crust. The metals are rarely found in their pure form. Instead, they are made from an iron/silicon alloy known as ferrosilicon. Glass’ main constituent is Element Silicon, also known as silicon dioxide. This is a cheap material with great mechanical, optical and thermal properties. You can make ultra-pure silica by adding boron or gallium, phosphorus or arsenic. Silicon is then used to manufacture transistors and solar cells.
What’s Ti?
With an atomic mass 47.867, Titanium, also known as Ti (atomic number 22), is a 4th-period group D element. The basic form of titanium is silver-gray with a white metallic look. Titanium can be chemically and physically identical to zirconium. This is because it has the same amount of valence electronics as titanium and falls under the same group on the periodic table. You can find five isotopes naturally: 46Ti-50Ti and 48Ti. The most common (73.8%) being titanium. It is also found in sedimentary rocks.
Titanium Silicide TiSi2 Pulver Production Methods
By reacting titanium with silicon, you can create titanium disilicide.
Ti + Ti 2Si = TiSi2
This can be done by sulfur, aluminum, and silicone dioxide.
A second method involves reacting titanium tetrachloride and silane, diclosilane, silicon.
TiCl4 + 2SiH4 – TiSi2 + 4HCl + 2H2
TiCl4 + 2SiH2Cl2 + 2H2 – TiS2 + 8HCl
TiCl4 + 3Si – TiSi2 + SiCl4
Titanium Silicide TiSi2 Pulp
In the semiconductor industry, titanium silicide is commonly used. This silica is typically grown on silicon wires and polysilicon wires with self-aligning silicide technology. It reduces the resistance to local transistor connections by reducing their thin layers. This is a common use in the microelectronics field, where it’s used in the stage C54.
The source, gate, leak contacts and interconnections of CMOS integrated Circuits are all made from titanium silicide. These applications require that the titanium silicide phases have low resistance (20m o –cm) as well as not to agglomerate in high-temperature treatments. For electronic applications, the Ti/Si system contains two silicide layers: C49 TiSi2 has a high resistivity (60-70mo-cm) and C54 TiSi2 has a low resistivity (15-20mo-cm), both formed at 700-850 degrees C.
Titanium siicide TiSi2 Pulver is main supplier
Lempotee advanced materials Nano Technology Co. Ltd. (Lempotee), is a trusted supplier and manufacturer of chemicals and Nanomaterials. They have over 12-years experience in manufacturing high-quality chemical products.
High-quality products are what you want titanium silicide TiSi2 powder Please feel free and contact us to send an enquiry. (brad@ihpa.net)
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