Metal Alloy High Purity Titanium Sputtering Target

Titanium spewing targets are used frequently in flat display coatings, hardware tool coatings, decorative coatings, semiconductor components and for semiconductor components. This is also one the key materials used to make integrated circuits.

Metal alloy High Purity Ti Titanium Sputtering Target – Specification: ASTM B265, ASME SB265, ASTM M67, ASTM FM1365, ASTM B265, ASTM B265, ASTM B265, ASTM B265, ASTM B265, ASTM B265, ASTM B265 Properties: Titanium sputtering targets are made from titanium, which is well-known for its superior strength-to weight ratio. Titanium is a very strong metal that has a low density. This makes it quite ductile in oxygen-free conditions. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low thermal and electric conductivity, it is also paramagnetic. Uses: It’s primarily used in flat panel, DRAMS and integrated circuit applications. Shipping and payment:

Steel Alloy High Purity Ti Titanium Sputtering Target Property

Additional Names The Titanium sputtering goal

N/A
Compound Formula Ti
Molecular Weight N/A
Appearance N/A
Melting Point N/A
Solubility In Water N/A
Density N/A
Purity 99.6%
Size Individualized
Boling Point N/A
Specific Heat N/A
Thermo Conductivity N/A
Thermal Expansion N/A
Young’s Module N/A
Exact Mass N/A
Monoisotopic N/A

Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information

Safety Notice N/A
Hazard Statements N/A
Flashing Point N/A
Hazard Codes N/A
Risk Codes N/A
Safety statements N/A
RTECS # N/A
Transport Information N/A
WGK Germany N/A


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